Number of found documents: 643
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Microstructure modifications of Al-Si-coated press-hardened steel 22MnB5 by laser welding
Šebestová, Hana; Horník, Petr; Mika, Filip; Mikmeková, Šárka; Ambrož, Ondřej; Mrňa, Libor
2024 - English
Weld microstructure depends on the characteristics of welded materials and parameters of welding technology, especially on the heat input that determines the peak temperature and the cooling rate. When the coated sheets are welded, the effect of the chemical composition of the coating must be also considered even though its thickness is only a few tens of microns. During 22MnB5+AlSi laser welding experiments, the ferrite-stabilizing elements of coating modified the weld metal microstructure. Ferrite appeared in a quenched weld metal. The rapid cooling rate accompanying welding with a focused beam limited the homogenization of the weld metal which resulted in the formation of ferritic bands in the regions rich in Si and especially in Al. On the other hand, a high level of homogenization was reached when welding with the defocused beam. The ferritic islands uniformly distributed in the weld metal were formed at 0.4 wt% and 1.6 wt% of Si and Al, respectively. The doubled heat input reduced the Al content to 0.7 wt% insufficient for the ferrite formation at still relatively high cooling rates. Predicting the distribution of ferrite in the weld metal is challenging due to its dependence on various factors, such as cooling rate and the volume of dissolved coating, which may vary with any modifications made to the welding parameters. Keywords: laser welding; high-strength steel; microstructure; heat input; ferrite stabilization Available at various institutes of the ASCR
Microstructure modifications of Al-Si-coated press-hardened steel 22MnB5 by laser welding

Weld microstructure depends on the characteristics of welded materials and parameters of welding technology, especially on the heat input that determines the peak temperature and the cooling rate. ...

Šebestová, Hana; Horník, Petr; Mika, Filip; Mikmeková, Šárka; Ambrož, Ondřej; Mrňa, Libor
Ústav přístrojové techniky, 2024

Influence of ball material on the resulting fatigue life of thermal sprayed HVOF coatings in dynamic impact testing
Duliškovič, J.; Daniel, Josef; Houdková, Š.
2024 - English
Dynamic impact wear, i.e. contact between two components in the presence of high cyclic local loads, is a challenging failure mode that occurs in many mechanical applications. Many previous studies have confirmed that dynamic impact testing is suitable for evaluating the contact fatigue of thermal sprayed coatings. However, the effect of the test parameters on the resulting lifetime is unclear. The aim of this study describes the effect of the ball material used in the dynamic impact test on the resulting fatigue life of the HVOF thermal sprayed coating. Three test balls made of WC/Co alloy, Si3N4 silicon nitride and 440 C steel were chosen for this study. Dynamic impaction testing was carried out on the Cr3C2-NiCr coating, which was sprayed by HVOF on a 1.2376 high-speed steel substrate. The impact lifetime was described by the number of critical impacts, i.e. the number of impacts before coating fatigue occurs. Furthermore, the depth and volume of impact craters were measured. Using scanning electron microscopy (SEM), the surface of the impacts as well as the microstructure of the coating on the cross-section in the region of the impacts were observed. Furthermore, the mechanism of crack propagation in the coating and the microstructure of the indentor were investigated. Keywords: dynamic impact test; HVOF; Cr3C2-NiCr; fatigue Available at various institutes of the ASCR
Influence of ball material on the resulting fatigue life of thermal sprayed HVOF coatings in dynamic impact testing

Dynamic impact wear, i.e. contact between two components in the presence of high cyclic local loads, is a challenging failure mode that occurs in many mechanical applications. Many previous studies ...

Duliškovič, J.; Daniel, Josef; Houdková, Š.
Ústav přístrojové techniky, 2024

Functional Tungsten-based thin films and their characterization
Košelová, Zuzana; Horáková, L.; Sobola, Dinara; Burda, Daniel; Knápek, Alexandr; Fohlerová, Z.
2024 - English
Anodizing is a technique by which thin oxide layers can be formed on a surface. Thin oxide layers have been found to be useful in a variety of applications, including emitters of electrons. Tungsten is still a common choice for cold field emitters in commercial microscopy applications. Its suitable quality can be further improved by thin film deposition. Not only the emission characteristic can be improved, but also the emitter operating time can be extended. Tungsten oxide is known for its excellent resistance to corrosion and chemical attack due to its stable crystal structure and strong chemical bonds between tungsten and oxygen atoms. Many techniques with different advantages and disadvantages have been used for this purpose. Anodization was chosen for this work because of the controllable uniform coverage of the material and its easy availability without the need for expensive complex equipment. The anodizing process involves applying an electrical potential to tungsten while it is immersed in an electrolyte solution. This creates a thin layer of tungsten oxide on the surface of the metal. The thickness and properties of the resulting oxide layer can be controlled by adjusting the anodization conditions, such as the electrolyte solution, voltage, and the duration of the process. In this work, H3PO4 was used as the electrolyte to test whether these tungsten oxide layers would be useful for electron emitters, for use in electron guns and other devices that require high-quality electron emitters. The properties were evaluated using appropriate techniques. In general, anodization of tungsten to form thin layers of tungsten oxide layers is a promising technique for producing high quality electron emitters. Keywords: cold-field emission; thin layer deposition; tungsten oxide; resonance enhanced tunneling; anodization Available at various institutes of the ASCR
Functional Tungsten-based thin films and their characterization

Anodizing is a technique by which thin oxide layers can be formed on a surface. Thin oxide layers have been found to be useful in a variety of applications, including emitters of electrons. Tungsten ...

Košelová, Zuzana; Horáková, L.; Sobola, Dinara; Burda, Daniel; Knápek, Alexandr; Fohlerová, Z.
Ústav přístrojové techniky, 2024

Surface acoustic wave microfluidic chip for rapid cell sorting
Vejrosta, Jakub; Maňka, Tadeáš; Plichta, Tomáš; Šerý, Mojmír
2023 - English
This work revolves around microfluidics and micro-objects manipulation in general. In our device, we are producing surface acoustic wave (SAW). The SAW can be used to sort particles by their size or physical properties and separate them. In medical analysis SAW on microfluidic chip can be used to pre-sorting of body fluids or blood serum for further optical or chemical analysis. The wave is produced by pair of interdigital transducers (IDTs), which are situated on opposite sides of microfluidic channel. As our active material we have used lithium niobate crystalline material for its great piezoelectric properties. This work is also the precursor for measuring the rheological properties of a medium, such as micro-viscosity, via the measurement of the trajectory of a flow trace. Keywords: microfluidics; surface acoustic wave; light microscopy Available at various institutes of the ASCR
Surface acoustic wave microfluidic chip for rapid cell sorting

This work revolves around microfluidics and micro-objects manipulation in general. In our device, we are producing surface acoustic wave (SAW). The SAW can be used to sort particles by their size or ...

Vejrosta, Jakub; Maňka, Tadeáš; Plichta, Tomáš; Šerý, Mojmír
Ústav přístrojové techniky, 2023

Gold nanosystems for the detection of molecules using surface-enhanced Raman scatterings (SERS)
Benešová, Markéta
2022 - English
Raman spectroscopy is a non-destructive analytical technique to analyze the chemical structure of molecules by a phenomenon known as Raman scattering, which occurs by an inelastic interaction of photons with the valence electrons in molecular bonds. However, Raman scattering can be hard to observe due to other, more frequent phenomena, such as Rayleigh scattering or fluorescence. SERS (surface-enhanced Raman spectroscopy) uses localized surface plasmon resonance (LSPR) of metal nanostructures to amplify Raman scattering. LSPR is a coherent oscillation of conduction electrons that arises from the interaction of electromagnetic radiation with metal nanostructures. The amplification of Raman scattering occurs when the analyte is adsorbed on the surface of such nanostructure and the strong localized electric field interacts with the electrons in its molecular bonds. Signal amplification of several orders of magnitude can be achieved, commonly 103 or more. In our work, we determined the presence of a selected bacterial species by multi-functionalized golden nanoparticles called SERS-tags, which have their surface modified with an antibody and a Raman reporter. The antibody allows the nanoparticles to bind to the surface of a concrete bacterial species based on the antigen-antibody affinity. When the targeted bacterium is covered with the nanoparticles, the Raman reporter signal is amplified by SERS, providing specific and strong Raman response. Therefore, when the Raman reporter signal is detected in a sample, it confirms the presence of the specific bacterium on a single-cell level. Keywords: surface-enhanced Raman spectroscopy; SERS-tag Available at various institutes of the ASCR
Gold nanosystems for the detection of molecules using surface-enhanced Raman scatterings (SERS)

Raman spectroscopy is a non-destructive analytical technique to analyze the chemical structure of molecules by a phenomenon known as Raman scattering, which occurs by an inelastic interaction of ...

Benešová, Markéta
Ústav přístrojové techniky, 2022

Low-temperature emissivity of thin Al2O3 layers deposited on copper substrate
Frolec, Jiří; Králík, Tomáš; Nyman, L.; Pudas, M.; Kallio, E.
2021 - English
Copper is commonly used in cryogenic systems due to its high thermal and electrical conductivity along with excellent solderability. Very low emissivity values of copper surface also reduce in cryogenic systems heat load transferred by thermal radiation. These values may be, however, enhanced by a prospective coating, deposited usually in order to prevent chemical changes on highly reactive copper surface. This paper focuses on protective layers of Al2O3 with thicknesses up to 28 nm, deposited on polished copper. We measured total hemispherical emissivity at cryogenic temperatures before and after the coating process. Contribution of Al2O3 layer to original copper emissivity increased with rising temperature of the layer and with the layer thickness. However, emissivity of the coated copper stayed below 2%, allowing usage of the coated copper in systems where low heat load by thermal radiation is needed. Preliminary tests with oxygen plasma shows that deposited layers can effectively protect the copper surface against oxidation and maintain the original thermal-radiative properties. Keywords: heat transfer; thermal radiation; cryogenics; surface finish Available at various institutes of the ASCR
Low-temperature emissivity of thin Al2O3 layers deposited on copper substrate

Copper is commonly used in cryogenic systems due to its high thermal and electrical conductivity along with excellent solderability. Very low emissivity values of copper surface also reduce in ...

Frolec, Jiří; Králík, Tomáš; Nyman, L.; Pudas, M.; Kallio, E.
Ústav přístrojové techniky, 2021

Patterning of conductive nano-layers on garnet
Chlumská, Jana; Lalinský, Ondřej; Matějka, Milan; Krátký, Stanislav; Kolařík, Vladimír
2021 - English
Synthetic crystalline materials of the garnet group are used as scintillators in scanning electron microscopy. If a thick conductive layer is applied on the garnet surface, slower electrons don't have enough energy to pass through this relatively thick conductive layer on the scintillator surface. Therefore, either thinner conductive layer or appropriate patterning of the thicker layer has to be used. Within this contribution we study the patterning process of such conductive nano-layer. Resolution of the patterning process is of high interest. Two approaches are compared: direct writing electron beam lithography and mask projection UV lithography. Keywords: Electron beam lithography; nano-patterning; yttrium aluminium garnet Available at various institutes of the ASCR
Patterning of conductive nano-layers on garnet

Synthetic crystalline materials of the garnet group are used as scintillators in scanning electron microscopy. If a thick conductive layer is applied on the garnet surface, slower electrons don't have ...

Chlumská, Jana; Lalinský, Ondřej; Matějka, Milan; Krátký, Stanislav; Kolařík, Vladimír
Ústav přístrojové techniky, 2021

A sampler of diffraction and refraction optically variable image elements
Horáček, Miroslav; Krátký, Stanislav; Matějka, Milan; Chlumská, Jana; Meluzín, Petr; Pirunčík, J.; Aubrecht, I.; Kotrlý, M.; Kolařík, Vladimír
2021 - English
Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 diffraction structures binary, tertiary, quaternary and blazed gratings (period range 400 nm 20,000 nm) represents a cross-section throughout technological steps mastering, galvanic replication and embossing. Electron-beam writing technology with Gaussian beam and electron energy of 100 keV, with very small forward scattering of high energy electrons and with the possibilities to create a linear grating with the minimal period of 100 nm, was used to create the master. An important advantage of high-resolution electron-beam lithography is its substantial flexibility in combining possible planar structures with significantly different parameters, such as very dense and relatively shallow structures together with deep structures (approx. 10 microns) with precise shapes (micro-lenses or Fresnel structures). For protection of documents and valuables, interesting results are induced with planar optical structures consisting of non-periodic arrangements, which are characterized by high robustness to counterfeiting and imitation. While the origination process is available for grating period down to 100 nm, the mass replication technology appears to be a bottleneck of the entire technological process. Measurement of topology and profiles of the structures by atomic forces microscope and documenting the quality of technological process of the three steps of replication of planar optically variable elements was performed for all 36 structure types of sampler. Keywords: diffraction; refraction; e-beam writer; embossing; galvanic replication; mastering; optically variable image element; security; valuables Available at various institutes of the ASCR
A sampler of diffraction and refraction optically variable image elements

Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 ...

Horáček, Miroslav; Krátký, Stanislav; Matějka, Milan; Chlumská, Jana; Meluzín, Petr; Pirunčík, J.; Aubrecht, I.; Kotrlý, M.; Kolařík, Vladimír
Ústav přístrojové techniky, 2021

Apparatus for automatic chemical etching of metallographic samples
Ambrož, Ondřej; Čermák, Jan; Mikmeková, Šárka
2021 - English
The microstructure of steels after mechanical polishing is revealed only by the application of a suitable etchant. To achieve adequate optical or electron microscope images, the specimen surface must be free of any artifacts. Chemical etching can be defined as a controlled corrosion process. The metal of the investigated material passes as cations into the etchant solution during the chemical etching reaction. Chemical etching is usually performed manually either by immersing the sample in the etchant with simultaneous stirring or by swabbing with a lint-free cloth soaked in the etchant. It is also extremely important to debug the process of removing the sample from the bath and subsequent cleaning. It is recommended to wash the sample after removal from the etchant with water (distilled or demineralized) or alcohol (ethanol, methanol, or isopropyl alcohol) and dry it properly (depending on the etchant and the etched material). The main problem with these processes is the human factor, which significantly contributes to the already limited repeatability. All operation steps must be performed by properly trained personnel in the field of occupational safety because hazardous substances are handled. A high manual dexterity is also needed. Training a new employee is a long-term process. Moreover, keeping the exact etching time can be a challenge and one second can decide success. These problems become more serious in the case of using surface sensitive analytical method, such as a low energy scanning electron microscopy, due to the high spatial resolution and extreme surface sensitivity. We have developed an apparatus for automatic etching of metallographic samples of purpose to overcome all above-mentioned difficulties. The apparatus and results of the first experiments will be presented. Keywords: metallography; chemical etching; automation; SEM; ultrasonic bath Available at various institutes of the ASCR
Apparatus for automatic chemical etching of metallographic samples

The microstructure of steels after mechanical polishing is revealed only by the application of a suitable etchant. To achieve adequate optical or electron microscope images, the specimen surface must ...

Ambrož, Ondřej; Čermák, Jan; Mikmeková, Šárka
Ústav přístrojové techniky, 2021

Thermal stability of Ti/Ni multilayer thin films
Václavík, R.; Zábranský, L.; Souček, P.; Sťahel, P.; Buršík, Jiří; Fořt, Tomáš; Buršíková, V.
2021 - English
In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100-800 degrees C. Keywords: Ti/Ni; multilayers; magnetron sputtering; nanoindentation; annealing Available at various institutes of the ASCR
Thermal stability of Ti/Ni multilayer thin films

In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using ...

Václavík, R.; Zábranský, L.; Souček, P.; Sťahel, P.; Buršík, Jiří; Fořt, Tomáš; Buršíková, V.
Ústav přístrojové techniky, 2021

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